Focused Ion Beam ( FIB) for IC modification and probe-point creation
The P3X-IV is ideal for editing front-side ICs manufactured with complex processes using copper, low-k dielectric and multiple metal layers. The DCG SystemsP3X-IV is the most advanced front-side circuit edit FIB available today and the only practical solution for modifying 90nm down to 65nm technology devices. The P3X-IV performs every major edit process, including conductor deposition, selective metal etch, and selective dielectric etch.