Focused Ion Beam ( FIB) for IC modification and probe-point creation

The P3X-IV is ideal for editing front-side ICs manufactured with complex processes using copper, low-k dielectric and multiple metal layers.
The DCG Systems P3X-IV is the most advanced front-side circuit edit FIB available today and the only practical solution for modifying 90nm down to 65nm technology devices. The P3X-IV performs every major edit process, including conductor deposition, selective metal etch, and selective dielectric etch.
  • Circuit Edit
  • Front Side
  • Copper Etching
  • High Aspect Ratio



P3X is a FEI EFA group solution

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