nProber

 

Integrated & Optimized solution for 22nm

The DCG Systems nProber, flagship product in the NanoWorks® product line, is designed and optimized to electrically probe sub-100nm features on semiconductor devices with superior ease-of-use and throughput.

 

 

Integrated solution

The nProber is comprised of a state-of-the-art nanomanipulator integrated into a high resolution and highly accurate low keV SEM, capable of sub-500 eV imaging at low beam currents. Data acquired via the probes is interpreted using an industry standard parametric analyzer.

 

  • Electrical Probing quality - Stability & Repeatibility

The nProber incorporates a unique advanced anti-contamination system, the Optimizer®, which automatically and rigorously cleans the SEM chamber and the probe tips, thus enabling the system to achieve low noise measurements with better than 200 fA accuracy.

  • Efficient Probing – Landing & motion capabilities

The nProber employs a semi-automated process flow for higher throughput and ease-of-use. Eight encoded positioners may be placed with 2 nm resolution probe steps. The XYZ encoded center stage provides step and repeat capability, while allowing the probes to remain in registration while the sample is moved to the next bit, making the nProber ideal for probing repetitive structures on a device-under-test ( DUT).

 

An easy-to-use Windows based software platform seamlessly integrates all components of the nProber. The Field Emission Scanning Electron Microscope (FE SEM) provides the optimal beam shift resolution, video rates, vacuum technology, and user control required for IC nanoprobing. The nProber’s electrical characterization system is specifically designed for low-noise measurements.

 

  • Flexible configuration allowing multiple applications
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Contact us if you want more detailed description on our solution

 

 


nProber is a DCG Systems solution

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NproberTM

Integrated & Optimized solution for 22nm

The DCG Systems nProber, flagship product in the NanoWorks® product line, is designed and optimized to electrically probe sub-100nm features on semiconductor devices with superior ease-of-use and throughput.



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